Mask
screens a surface or a signal to a certain shape.
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Product
MRM(Mask)
MRM Series
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- Fully automated system that can produce masks by automating the mask production process such as fabric supply, molding, cutting, and bonding.
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Product
Tabletop Front & Backside Mask Aligner
Model 200IR
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The OAI Model 200IR Mask Aligner is a tabletop system that requires minimal clean room space. It is a cost-effective alternative for R&D or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The Model 200IR Mask Aligner is capable of one micron resolution and alignment precision. It has an alignment module which features mask insert sets and quick-change wafer chucks that enable the use of a variety of substrates and masks without requiring tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and z-axis.
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Product
Bounded Output Mask
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The bounded output mask provides a means of ensuring that measurements of TI according to IEC 62359 can satisfy the requirement of only determining the ultrasonic output through an area of 1 cm x 1 cm.
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Product
MASK DR-SEM
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Our defect review SEM tools perform detailed reviews of minute defects on photomasks.
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Product
Automated Front & Backside Mask Aligner System
Model 6000
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With over 4 decades of manufacturing in the semiconductor industry, OAI meets the growing challenge of a dynamic market with an elite class of production photolithography equipment. Built on the proven OAI modular platform, the Model 6000 has front and backside alignment that is fully automated with a submicron printing capability as well as submicron top to bottom front side alignment accuracy which delivers performance that is unmatched at any price. Choose either topside or optional backside alignment which uses OAI’s customized advanced recognition pattern software. These Mask Aligners have OAI’s Advanced Beam Optics with better than ±3% uniformity and a throughput of 200 wafers per hour in first mask mode, which results in higher yields. The Series 6000 can handle a wide variety of wafers from thick and bonded substrates (up to 7000 microns), warped wafers (up to 7 mm-10mm), thin substrates (down to 100 micron thick), and thick photo resist.
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Product
Custom Solutions for Mask Aligners
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OAI offers custom designed solutions built to your unique specification.
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Product
Tabletop Mask Aligner
Model 200
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The OAI Model 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven components that have made OAI a leader in the photolithography capital equipment industry. The Model 200 is a tableop mask Aligner that requires minimal cleanroom space. It offers an economic alternative for R&D, or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one micron resolution and alignment precision.
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Product
DUV Mask Aligner
Model 200E
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OAI’S Model 200E DUV Mask Aligner performs all the functions of the tabletop Model 200 Mask Aligner but utilizes a 185nm Excimer Lamp as the UV light source. It is used for Biotechnology Processing.
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Product
Automated Mask Aligner with Integrated Mask Changer
Model 6000A-MC
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The Model 6000A-MC is a precision system combining OAI’s Model 6000, Automated Production Mask Aligner, with an integrated mask changer. The mask changer can handle from 10 to 150 masks. Ideal for both semiconductor and bio-tech applications. It also is designed with a bar code reader to assure each mask is coordinated to the right process. Please contact OAI for further product information.
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Product
MASK MVM-SEM® E3600 Series
E3650
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Amid the progress of multiple-exposure technology, and the development of finer-pitch and more complicated circuits, as well as increases in the number of masks and the number of measurement points on each mask, the size of wiring patterns formed on photomasks needs to be measured and evaluated stably with high precision. Advantest’s E3600 series meets the needs of state-of-the-art devices with high measurement repeatability and stable throughput.
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Product
MASK MVM-SEM® E3600 Series
E3630
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Together with the miniaturization of semiconductors, high-accurate and stable measurement and evaluation is needed for circuit patterns such as mask patterns and holes. Advantest's E3600 series are used by a wide variety of companies, from semiconductor manufacturers to photomask makers to device and materials producers.
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Product
Mask Produce and Test Machine
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LISUN produce the bfe tester for face mask, pfe tester, melt-blown cloth electrostatic electret generator according to ASTM F1862-17, ASTM F2299-03 (2017), ASTM F2100-2019, BS EN14683-2019, BS EN 14387-2004+A1 2008, BS EN 136-1998, BS EN 140-1999, BS EN 143-2000 +C1-A1, BS EN 149-2001+A1
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Product
Large Substrate Mask Aligner
Model 6020
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The Model 6020 is a large substrate Production Mask Aligner or Auto-flood Exposure System for RDL First Level Advanced Packaging (PLP) and markets requiring exposure of large glass panels. It is engineered with OAI’s precision, reliability, and quality that is found in all of OAI’s products. The features include wedge effect leveling, superb process repeatability, ≤ 2.0µm printing resolution, and remote diagnostics. Using robotic handling, the system can stand alone or be fully integrated with photo resist processing.
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Product
Mask Treatment Process
Model 100MT
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OAI offers a unique process which extends the life of your mask, says good bye to tedious washing and drying of mask and thus enables your mask aligner to have increased productivity at the lowest cost of ownership. The Model 100 MT is a 2 step process.
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Product
Mask Alignment Systems
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EVG’s inventions, such as the world’s first bottom-side alignment system in 1985, have pioneered and set the industry standards in both top and double-sided lithography, aligned wafer bonding and nanoimprint lithography. EVG contributes in these areas through continuous development of mask aligner product generations to augment this core lithography technology.
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Product
Medical Mask Gas Exchange Pressure Difference Tester
DRK371-II
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Shandong Drick Instruments Co., Ltd.
It is used to measure the gas exchange pressure difference of medical surgical masks and other products.
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Product
Power Measurements For The 3000A/T/G X-Series
D3000PWRB
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The power software package for Keysight’s InfiniiVision 3000A, 3000T, and 3000G X-Series oscilloscopes enables a broad range of automated power supply characterization measurements including critical frequency response measurements (3000T/G X-Series only) such as power supply rejection ratio (PSRR) and control loop response. This package also enables hardware-based pass / fail mask testing and USB PD triggering and decode (3000T/G X-Series only).
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Product
Oscilloscope - 200 MHz, 4 Analog Channels
DSOX4024A
Oscilloscope
200 MHz4 analog channels Easily view signals on the large 12.1-inch capacitive touch screen Isolate signals in seconds with exclusive Zone touch triggering Capture more data with 4 Mpts memory and standard segmented memory See more signal detail with 1,000,000 wfms/s update rate Expand your measurement capabilities with full upgradability: Add bandwidth, digital channels, dual-ch 20 MHz arbitrary WaveGen, 3-digit DVM, serial trigger and analysis & mask testing
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Product
Face Masks Particulate Filtration Efficiency PFE Tester
GLE-20
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GLE-20 is an oil-salt two-in-one Face Masks Particulate Filtration Efficiency PFE Tester. According to ASTM F1862-17, ASTM F2299-03 (2017), ASTM F2100-2019, BS EN14683-2019, BS EN 14387-2004+A1 2008, BS EN 136-1998, BS EN 140-1999, BS EN 143-2000 +C1-A1, BS EN 149-2001+A1, etc. It is used to test the particulate filtering efficiency of daily protective masks and medical masks, and to determine the obstruction performance of ordinary fabrics and medical protective masks against a constant flow of airflow.
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Product
350 MHz, 2 Analog Plus 16 Digital Channels Oscilloscope
MSOX3032A
Oscilloscope
350 MHz2 analog plus 16 digital channels Easily view your signals on the 8.5-inch WVGA display Capture more data with up to 4 Mpts memory See more signal detail with 1,000,000 wfms/s update rate Expand your measurement capabilities with full upgradability: Add bandwidth, memory, 20 MHz arbitrary waveform generator, 3-digit voltmeter, serial trigger and analysis, segmented memory & mask testing at any time
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Product
Masks Flame Retardant Performance Tester
WKS-1208
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WKS-1208 Masks Flame Retardant Performance Tester is used to test the burning performance of the mask after contacting the flame at a certain linear velocity. It is special test instrument for the flame retardant performance of masks.
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Product
GAOTek Portable H/L Voltage Clamp Current Leaker
GT00YA00ZX
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The GAOTek Portable H/L Voltage Clamp Current Leaker measures high voltage current with a 12.5 in (32 cm) insulating rod, adopting the latest CT technology and integrating mask digital technology. This instrument provides high precision, reliability, and stability with its integrated design between transducer clamp and domain. This leaker can be used to measure any wire with or without the insulation layer where the voltage is below 10 kV. The insulating rod is portable, moisture resistant, heat resistant, shock resistant, and insulating. It provides additional functionalities such as online current testing, peak and data holding, data storage, detection of high and low current in primary and secondary circuits separately, and provision of suitable calculations to conclude change in high and low pressure.
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Product
Thyristors Application Specific Devices
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A.S.D. (Application Specific Discretes) technology is a vertical integrated power technology using a full planar process. By applying the masking process on both sides of the chip, higher current density is achievable than is possible with epitaxial base or horizontal structures.
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Product
Oscilloscope - 1 GHz, 4 Analog Channels
DSOX4104A
Oscilloscope
1 GHz4 analog channels Easily view signals on the large 12.1-inch capacitive touch screen Isolate signals in seconds with exclusive Zone touch triggering Capture more data with 4 Mpts memory and standard segmented memory See more signal detail with 1,000,000 wfms/s update rate Expand your measurement capabilities with full upgradability: Add bandwidth, digital channels, dual-ch 20 MHz arbitrary Wave Gen, 3-digit DVM, serial trigger and analysis & mask testing
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Product
InfiniiVision Oscilloscopes
1000 X-Series
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50 MHz to 100 MHz See more signal detail with 50,000 wfms/sec update rate Make professional measurements, including mask, math, FFT, analog bus, and protocol triggering/decode Quickly learn how to use; Oscilloscopes have built-in help and training signals Educators can easily set up teaching labs with the free Educator’s Resource Kit
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Product
Oscilloscope - 500 MHz, 2 Analog Channels
DSOX4052A
Oscilloscope
500 MHz2 analog channels Easily view signals on the large 12.1-inch capacitive touch screen Isolate signals in seconds with exclusive Zone touch triggering Capture more data with 4 Mpts memory and standard segmented memory See more signal detail with 1,000,000 wfms/s update rate Expand your measurement capabilities with full upgradability: Add bandwidth, digital channels, dual-ch 20 MHz arbitrary Wave Gen, 3-digit DVM, serial trigger and analysis & mask testing
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Product
Mixed Signal Oscilloscope - 500 MHz, 2 Analog Plus 16 Digital Channels
MSOX4052A
Oscilloscope
500 MHz2 analog plus 16 digital channels Easily view signals on the large 12.1-inch capacitive touch screen Isolate signals in seconds with exclusive Zone touch triggering Capture more data with 4 Mpts memory and standard segmented memory See more signal detail with 1,000,000 wfms/s update rate Expand your measurement capabilities with full upgradability: Add bandwidth, dual-ch 20 MHz arbitrary Wave Gen, 3-digit DVM, serial trigger and analysis & mask testing at any time
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Product
MASK MVM-SEM® E3600 Series
E3640
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Ongoing semiconductor process shrinks are driving new demand for stable, highly precise measurement of pattern dimensions for photomask and wafer production. The E3640 satisfies these requirements with industry-leading precision measurement capabilities and upgraded functionality that enhances mask R&D and production efficiency.
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