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Product
Gratings for Synchrotron, FEL and EUV Light Sources
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HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Product
Immersion Systems
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Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Product
wavefront sensors
HASO EUV
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Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Product
EUV Lithography
NXE systems
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NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Product
Scanning Electron Microscope
E5620
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The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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EUV Lithography Systems
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Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Product
EUV Lithography
EXE systems
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EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Product
Dry Systems
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Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Product
Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
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The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Product
Patterning Simulation
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KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Product
Detectors
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Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Product
Semiconductor
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Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Product
Extreme Performance Edge Servers
Ark-7000 Series
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ARK-7000 series feature Intel Xeon processors and multiple expansion slots, delivering high-speed data transfer rates and enhanced remote management.
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Product
"Extremely Random" Precision Noise Generator
Model 3025
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The Model 3025, "Extremely Random"TM Precision Noise Generator supplies White and Pink Noise, and a 1 kHz reference signal. Crystal controlled - the pseudo random circuitry provides a 6.5 Day pseudo-random cycle time, assuring a "Extremely Random"TM noise source.
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Product
Light Source
UVF-210S
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By traversing two light guide ends (right and left) by means of the high accuracy air cylinder, alternating irradiation of two independent positions is possible.
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Product
Economic Extreme Power Temperature Forcing System
ECO Cool
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ECO Cool® Economical Powerful - Thermal Forcing System.Exceptionally Powerful, Economical & Reliable
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Product
Light Microscopy
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Materials Evaluation and Engineering
MEE has a variety of light microscopes with magnifications ranging from 5X to 2400X. Each microscope is connected to a camera with digital image capture for subsequent measurements and/or additional image analyses.
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Product
Light Sources
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Bentham's range of light sources has evolved to suit the requirements of our systems and their users and now offers single or multiple sources from 200nm to 40m:
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Product
Light Source
LS-BA
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Balance Light Source (LS-BA) is designed for transmittance and absorbance measurement with color information. Halogen Light source provides the stable and smooth wide-band spectral output. It’s proper for most visible to near infrared range measurement. The efficiency of blue region will be enhanced by extra two blue LEDs.
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Product
Vehicle Lighting
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The lights are designed for both the retrofit and new build market and include normal visible, NVG Compatible, NVG Friendly and Covert technology. Solutions include infra-red (IR) external lights and low profile interior cabin lighting and task lighting.
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Product
Light Meters
LXP-10A
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The new LXP digital light meter family allows for a very precise measurement of illuminanace. Thanks to very high resolution (resolution 0.001 lx ) allows for escape route emergency light measurement. All of three light meter have built-in memory for measurement result storing, and additional function making work much easier.
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Product
GO-SPEX200 Ultraviolet Space Radiation Distribution Measurement System
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Hangzhou Everfine Photo-E-Info Co., LTD
GO-SPEX200 adopts the special darkroom-integrated design, integratesl electric, radiation, temperature controller, it specialized for UV LED package (including integrated packaging) of the total radiation flux, spatial distribution of radiation intensity (light distribution performance), radiation intensity data, angle, total radiation flux accurate testing, comply with relevant standards.
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Product
Light Sensor
NaPiCa
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Panasonic Industrial Devices Sales Company of America
Visible light sensor (Silicon Photo IC) that detects light and converts into electrical current. Consists of a photodiode and built-in amplifier. Optical filter provides spectral response similar to human eye sensitivity. Applications include: LCD Backlight Control, Commercial and Residential Lighting Brightness Control, Security Lighting.
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Product
Lighting ICs
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Based on its 30-year experience in power conversion and high-voltage technology, ST offers a wide portfolio of solutions for electronic ballasts, ranging from high-voltage ballast controllers for analog solutions (with or without embedded PFC), to complete power management units with integrated drivers and voltage regulator for digital platforms.
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Product
Light Source
FiberPal OT-3000
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The OT-3220/3221 is designed for a high performance stabilized laser source, especially in practice for FTTX networking installation and maintenance fieldworks environment requirements. It is usually applied as stable laser sources for wide range of optical testers and tools in optical fiber cabling and transmission systems.
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Product
Ultraviolet Meter
UVR Series
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UVR series is suitable to manage lamp of ultraviolet curing equipment, Also suitable to measure intensity of ultraviolet ray for sun light and lamp.
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Product
Diamond-Like Carbon: High-Performance Coatings for Extreme Applications
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When durability matters, Diamond-Like Carbon (DLC) coatings deliver. Known for their hardness, low friction, and chemical resistance, DLC films are the go-to solution for protecting surfaces in high-stress environments: from precision mechanical parts to advanced semiconductor devices.
