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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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EUV Lithography
EXE systems
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Scanning Electron Microscope
E5620
The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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X-Ray Cameras for Soft X-Ray, VUV, and EUV Applications
SOPHIA® XO
Teledyne Princeton Instruments
SOPHIA® XO offers high-sensitivity (>95% QE) and high-speed for the widest range of VUV and x-ray detection, with thermoelectric cooling up to -90℃ and high frame rates. With a rotatable, industry-standard CF flange and high-vacuum seal design the software-selectable gains and readout speeds make this camera well suited for UHV applications.
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Detectors
Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Ultraviolet Checker
For magnetic particle testing. Intensity of ultraviolet can be read directly in mw/c directly.
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Ultraviolet Meter
UVR Series
UVR series is suitable to manage lamp of ultraviolet curing equipment, Also suitable to measure intensity of ultraviolet ray for sun light and lamp.
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Solar Ultraviolet Pyranometers
UVR1-T, UVR1-A, &
The Middleton Solar UVR1 series are precision filter radiometers for measuring solar global ultraviolet irradiance. The UVR1-T and UVR1-A are suitable for air pollution monitoring. The UVR1-B is suitable for biological and human erythema (sunburn) monitoring.
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Ultraviolet Analyzers
Teledyne Analytical Instruments
Ultraviolet Analyzers by Teledyne Analytical Instruments
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Light Meter
LI-250A
The LI-250A is a portable meter that displays the output from any LI-COR light sensor that has a cable terminated with a BNC connector. It shows instantaneous values or 15-second averages of values from a sensor.
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Light Engines
Delivering the highest brightness and optical power available, our light engines provide optimized output solutions for a range of applications such as light guide and fiber optic coupling, fluorescence excitation, and unrivaled uniform near and far field illumination.
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Light Microscopes
Compound light microscopes from Leica Microsystems meet the highest demands whatever the application – from routine laboratory work to the research of multi-dimensional dynamic processes in living cells.
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Light Meters
These Handheld Light meters are compact for keeping on hand in the field. Models are available with a Thermocouple input for temperature measurement. Units with Data Logging are available
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Light Sources
Fiber optic light sources are a low-cost way to analyze and identify accurate fiber optic readings, while certifying optical fiber. Receive the ability to measure fiber optic light continuity, loss, and quality of the signal.
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Economic Extreme Power Temperature Forcing System
ECO Cool Dual Edition
Mechanical Devices is pleased to offer its customers with the first direct phase change TCU with DUAL head. Each head can be controlled individually. This DUAL head unit makes it possible to reduce the cost per workstation, saves space, reduces power consumption and heat emission in the laboratory or production hall.MD Thermal control units were designed with high efficiency and flexibility in mind, allowing for customization to suit different package and interface variations. The system allows for temperature forcing across a wide range of device sizes and types, whether socketed or soldered to the board.
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Light Soaker
MESO-11
Greensolar Equipment Manufacturing Ltd.
The Light Soaker (MESO) is used in photovoltaic production lines for reliability testing. Its purpose is to expose the PV panels with a constant, high intensity light to get it deteriorated. Measuring the time dependent deterioration of the electrical parameters of the PV structure the reliability parameters could be defined.
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Aircraft Lighting
Honeywell Aerospace Technologies
A leader in aircraft lighting systems since 1933, Honeywell Aerospace and its legacy company Grimes Aerospace, has the broadest portfolio and installed base in the industry.
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Light Source
LS-HA
provides the stable and smooth wide-band spectral output. It’s proper for most visible to near infrared range measurement. This light source is also designed to be used in the standard measurement package. It ‘s a simple and quick measurement platform.
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Light
Welcome to Thorlabs; below you will find links to light emitters, sources, and controllers, a subset of our entire line of photonics products. Our light sources are conveniently separated into coherent and incoherent sources. The coherent source category includes laser diodes, laser diode modules, tunable lasers, HeNe lasers, and femtosecond lasers, while the incoherent source link brings you to a selection of LEDs, white light, and broadband SLD sources. The Quantum Electronics category includes optical amplifiers, modulators, and gain elements that are frequently used in research and OEM applications. All of our light sources and optical amplifiers are supported by an extensive line of mounts, sockets, TEC controllers, and current controllers.
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Light Meters
TES Electrical Electronic Corp.
Dual Display, 4 digit LCD reading.Spectral Sensitivity close to CIE phototropic curve.Measuring levels ranging 0.001 to 1999kAccurate and instant response. Luminance ratio A/B
