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Detectors
Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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EUV Lithography
EXE systems
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Scanning Electron Microscope
E5620
The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Ultraviolet Light Distribution Measurement Film
UVSCALE
UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Ultraviolet Meter
UVR Series
UVR series is suitable to manage lamp of ultraviolet curing equipment, Also suitable to measure intensity of ultraviolet ray for sun light and lamp.
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Solar Ultraviolet Pyranometers
UVR1-T, UVR1-A, &
The Middleton Solar UVR1 series are precision filter radiometers for measuring solar global ultraviolet irradiance. The UVR1-T and UVR1-A are suitable for air pollution monitoring. The UVR1-B is suitable for biological and human erythema (sunburn) monitoring.
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Ultraviolet Checker
For magnetic particle testing. Intensity of ultraviolet can be read directly in mw/c directly.
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Light
Welcome to Thorlabs; below you will find links to light emitters, sources, and controllers, a subset of our entire line of photonics products. Our light sources are conveniently separated into coherent and incoherent sources. The coherent source category includes laser diodes, laser diode modules, tunable lasers, HeNe lasers, and femtosecond lasers, while the incoherent source link brings you to a selection of LEDs, white light, and broadband SLD sources. The Quantum Electronics category includes optical amplifiers, modulators, and gain elements that are frequently used in research and OEM applications. All of our light sources and optical amplifiers are supported by an extensive line of mounts, sockets, TEC controllers, and current controllers.
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Extreme Environment Sensors
For high pressure, low temperature, and high temperature applications* For applications requiring high accuracy, high reliability, and structural integrity.* Operating temperatures from -320°F to +1000°F (+1200°F short term).* Displacement systems withstand pressures up to 3500 or 5000 psi.* Dual-coil sensor design effectively minimizes radiation effects.* Hermetically sealed and laser welded.* Unaffected by environmental contaminants.
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Timing Lights
A stroboscope used to dynamically set the ignition timing of an Otto cycle or similar internal combustion engine equipped with a distributor. Modern electronically controlled passenger vehicle engines require use of a scan tool to display ignition timing.
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Light Booths
Konica Minolta Sensing Americas, Inc
Konica Minolta’s Light Booth products provide accurate results when inspecting a range of unique products including inks, paints, plastics, textiles, paper and colorants. Light booths simulate lighting conditions which allows testing in a multitude of different lighting conditions. This allows for incredibly precise color measurements in a spectrum of different lights and angles.
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Light Meter
PLMT56
Light Meter Measures In LuxOver-Range IndicatorLong-Life Silicon Photo Diode InsideMeasurement Rate: 1.5 Times per SecondMax Range: 50,000 LuxAccuracy: +/- 5% Under 10000 Lux, +/- 10% Over 10000 LuxMax Resolution: 0.1 LuxDimensions: 7.40' H x 2.52' W x 0.96' DAccessories Included: 12V A23 Battery, Photo DetectorSold as : Unit
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Chamber Light
LED-CL
The Teledyne Bowtech LED-CL Chamber Light is extremely safe and reliable, due to its advanced technology and innovation.The light has 100,000 hour life and has been designed specifically for use within the Hyperbaric Diving environment, whether that is in Hyperbaric Chambers, TUP's, Diving Bells or even Wet Bells.
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Light Meters
LXP-2
The digital light meter is a precision instrument used to measure illuminance (Lux, footcandle) in the field. It is meet CIE photopic spectral response. It is fully cosine corrected for the angular incidence of light. The illuminance meter is compact, tough and easy to handle owing to its construction. The light sensitive component used in the meter is a very stable, long-life silicon photo diode and spectral response filter.
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Lighting Reliability
LED/OLED package lifetime is highly dependent on thermal management, and LED lamp performance can be dependent on the luminaire in which it is installed. Lighting reliability test system for LED/OLED Products are widely used for normal /accelerated aging, lumen maintenance measuring, lifetime evaluation and temperature characteristic testing for LED/OLED products including LED package, array, module, OLED module and luminaires.
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Extreme Performance Edge Servers
Ark-7000 Series
ARK-7000 series feature Intel Xeon processors and multiple expansion slots, delivering high-speed data transfer rates and enhanced remote management.
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Digital Light Monitor
LMC-20
The LMC-20 functions not only as a light monitor for coating thickness, but also allows control of multi layer/multi material coating processes. Up to 2000 individual layers in a coating are possible, by using 40 program banks of 50 layers each. The characteristics of up to 99 different coating materials can be input as well. Final thickness can be calculated to 1% of a quarter wave.
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Light Microscopes
Compound light microscopes from Leica Microsystems meet the highest demands whatever the application – from routine laboratory work to the research of multi-dimensional dynamic processes in living cells.
