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PED Systems
Pulsed Electron Deposition
Is a process in which a pulsed (80-100 ns) high power electron beam (~1000 A, 15 kV) penetrates approximately 1 μm into the target resulting in a rapid evaporation of target material. The non-equilibrium heating of the target facilitates stoichiometric ablation of the target material. Under optimum conditions, the target stoichiometry is preserved in the deposited films. All solid state materials – metals, semiconductors and insulators, including those transparent to laser wavelengths in PLD – can be deposited as thin films with PED. By combining PLD and PED, the range of complex materials that can be prepared as thin films can be greatly enhanced.
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Breakthrough compressors for the GDSII and MEBES formats
GDZip + MEZip
Recognizing the challenge to transfer, manipulate, and store the exponentially-increasing size of IC design files, Solution-Soft has developed gdzip and mezip, breakthrough compressors for the GDSII and MEBES formats used by the industry. The MEBES format is the most commonly used format for electron beam lithography and photomask production. The GDSII stream is the standard exchange format between the design world and the mask shops.
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Electron Beam Lithography System
Spot type Electron Beam Lithography System JBX-8100FS achieved high throughput, small footprint and electric power saving.
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Light Sources
The unique dual-output of equivalent beams make it a useful source for many comparative applications in addition to wavelength calibration and so on. The two output beams originate from two views of the single emitting spot where the electron beam from the single hairpin filament collides with the interchangeable anode.
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Magnetic Field Cancelling System
MR-3
3-axis magnetic field cancelling system for electron microscopes (SEM and TEM), electron and ion beam experiments, nanotechnology, biomagnetic investigations, etc. High reliability through rugged analog design. No tedious programming, no chrashs. More than 1000 MR-3 systems sold worldwide.
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Microscopy Software/Hardware
ZEISS Atlas 5
Atlas 5 is your powerful hardware and software package that extends the capacity of your ZEISS scanning electron microscopes (SEM) and ZEISS focused ion beam SEMs (FIB-SEM). Use its efficient navigation and correlation of images from any source, e.g. light- and X-ray microscopes. Take full advantage of high throughput and automated large area imaging. Unique workflows help you to gain a deeper understanding of your sample.
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Focused Ion Beam Scanning Electron Microscopes
FIB-SEMs
Combine imaging and analytical performance of a high resolution field emission scanning electron microscope (FE-SEM) with the processing ability of a next-generation focused ion beam (FIB).
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X-Ray Systems
X-ray and radioactive devices developed by AET, are widely utilized for medical, industrial and research use. The Compact Pulse X-ray Source can accelerate electron beams in a high-gradient electric field, to produce X-rays. Dose Calibrators are utilized for radioactive examinations and treatments in the medical industry.
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Scanning Electron Microscopes
SEM
Scanning Electron Microscopes (SEM) scan a sample with a focused electron beam and obtain images with information about the samples’ topography and composition.
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Current Sensing Resistors: ACQ-200
TCS
These components are four-terminal. bus-bar, metal strip current shunts. Assembled using electron beam welding. These units can handle 15W of continuous power and a maximum current of 350A 90.1mohm). Also they can absorb a high pulse power rating and have very low inductance. They also feature excellent long term stability, less than 100ppm/C TCR, and have excellent frequency characteristics.
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XRT Source Brighthawk
The BRIGHTHAWK NT100 is a performance-leading microfocus X-ray tube comprising proprietary technology to achieve a high brightness output. The tube consists of a LaB6 crystal source for generation of the electron beam, a magnetic beam steering system, and a tungsten target for X-ray photon emission. The components are mounted in a precision-engineering housing and held at ultra-low vacuum levels for long-life performance. Following on from the successful 3rd generation tube, this 4th generation of tube across a wide energy range from 30 kV to 160 kV is highly configurable through a software interface to the internal control board, which is connected via an optical interface (through an Ethernet converter).
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Electron Probe Microanalyzer
EPMA-8050G
This instrument is equipped with a cutting-edge FE electron optical system, which provides unprecedented spatial resolution under all beam current conditions, from SEM observation conditions up to 1 μA order. Integration with high performance X-ray spectrometers that Shimadzu has fostered through the company's traditions achieves the ultimate advance in analysis performance.
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Hi Rate Multi-Pixel Detection
Systems utilizing multiple electron beams are an emerging semiconductor metrology technology that aims to increase throughput. El-Mul is a pioneer in developing detection solutions for such metrology systems and has designed and manufactured prototype detectors that can simultaneously detect 144 beams at 35MHz.
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A Highly Versatile R&D Bell Jar Thin Film Coating System.
MODEL VES-3000
TEK-VAC's VES-3000 coater station model offers a modular concept for thin film deposition. Common PVD techniques which can be employed in this compact unit include thermal and electron beam evaporation. A 2KVA SCR controlled filament evaporation power supply is provided. Optional ion deposition and magnetron sputtering devices can be incorporated in the system.
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Space Flight Components
A tec, Inc. specializes in the design, manufacture, and integration of complex test systems and quality critical components. Our production engineering expertise separates us from other manufacturing companies when both reliability and cost are important. Atec has the best in 5 to 9 Axis CNC machining, coordinate measuring machines (CMMs), 3D additive metal and plastic printers, 9-Axis capable waterjet, cryogenic liquid flow test benches and environmental test chambers. We can deliver to the tightest tolerances and most exacting requirements. We can advise our customers on electron beam welding, friction joining, electronic test, environmental test, acoustics, vibration and many other technologies that can reduce manufacturing and operating costs. We are currently manufacturing liquid rocket engine fuel and oxidizer valves for multiple launch vehicles and have participated in 158 consecutive launch successes. Atec manufactured and tested advanced lithium-ion battery adapter plates that manage power for the International Space Station. Atec is designing, manufacturing, and testing power flow modules that work to prevent system failure on the human crew capsule (CCTS) that will transport astronauts to/from the ISS. Atec was awarded NASA Agency-Level Small Business Subcontractor of the Year , SBA Region VI Subcontractor of the Year for our support to NASA and Boeing and we were named a DCMA Top 500 Supplier.
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TEM Lamella Preparation And Volume Imaging Under Cryogenic Conditions
ZEISS Correlative Cryo Workflow
ZEISS Correlative Cryo Workflow connects widefield, laser scanning, and focused ion beam scanning electron microscopy in a seamless and easy-to-use procedure. The solution provides hardware and software optimized for the needs of correlative cryogenic workflows, from localization of fluorescent macromolecules to high-contrast volume imaging and on-grid lamella thinning for cryo electron tomography.
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Electron Sources
SPECS Surface Nano Analysis GmbH
To our customers in research and industry we offer a variety of sources for deposition, excitation and charge neutralization as well as analyzers and monochromators. Most of our sources originate from product lines which we have taken over from Leybold AG, Cologne, and from VSI GmbH. The X-ray monochromator Focus 500 and the UV monochromator TMM 302 are original developments by SPECS.Compliance with industry standards, a good price-performance ratio, stability, and longevity are the guidelines for our product development. We focus on standardized easy handling, user-friendliness, standardized software interfaces and safety.
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Scanning Electron Microscope
Verios G4 XHR SEM
The Thermo Scientific™ Verios G4 scanning electron microscope (SEM) provides sub-nanometer resolution from 1 to 30 kV and enhanced contrast needed for precise measurements on materials in advanced semiconductor manufacturing and materials science applications, without compromising the high throughput, analytical capabilities, sample flexibility and ease of traditional Scanning Electron Microscope (SEM).
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Scanning Electron Microscopy
SEM
Materials Evaluation and Engineering
JEOL JSM-6610 LV LaboratoryScanning electron microscopy (SEM) uses electrons for imaging to obtain higher magnifications and greater depth of field than light microscopes. The instruments at MEE are capable of variable-pressure, or low vacuum, SEM (VPSEM), as well as traditional high-vacuum conditions for sample observation. VPSEM is a specialized method using a variable-pressure sample chamber that allows direct evaluation of samples that are not readily examined with a traditional high-vacuum SEM. Nonconductive or vacuum sensitive samples that would typically require additional sample preparation can be directly analyzed in VPSEM without the need for additional sample preparation, such as carbon or metallic conductive coatings. This reduces both sample preparation time and distractions in microanalysis. Our laboratory also has a field emission SEM (FESEM) for critical high-magnification work and low-voltage (LVSEM) applications. Each instrument has a spacious sample chamber that can accommodate large and irregularly-shaped specimens and accessories for feature dimensional analysis and chemical microanalysis.
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Electron Microscope Analyzer
QUANTAX EBSD
QUANTAX EBSD system, with its popular OPTIMUS 2 detector head, is the best available solution for analyzing nanomaterials in the SEM
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Beam Probes
The CO2 Laser Beam Probes are hand-held plates designed to simplify the alignment of IR optical systems. They display the laser beam as a dark image on a fluorescent background using the same UV-excited, thermal-sensitive surfaces developed for Macken Instruments'' Thermal Image Plates.
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EQE/Photon-Electron Conversion Testing
Enlitech offers different solutions for incident photon-electron conversion testing systems. The available systems include IPCE, PV External quantum efficiency (PV-EQE), Internal Quantum Efficiency, Spectral Response (SR), Highly-sensitive EL-EQE. There are over 1,000 SCI papers cited Enlitech‘s systems to provide reliable experimental data for significant scientific publication. The Highest PV-EQE sensitivity and EL-EQE both reach 10-5 % (7 orders). They can be utilized to PV conversion efficiency, HJT/ PERC/TOP-CON current-loss analysis, Organic PV charge-transfer-state and Perovskite PV trap state measuring, and Organic PV and Perovskite PV Voc loss analysis.
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X-Ray Beam Monitors
When standard products just aren’t good enough—or the measurement technology does not yet exist—Sydor Technologies develops technology to enable these complex imaging measurements. Just as we’ve developed next-generation streak cameras and x-ray detectors to meet novel, emerging requirements in national laboratories, we’re doing the same with x-ray beam monitors.
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Beam Pattern Measurement System
BP100
The BP100 is purpose-made for luminous intensity measurement of lamps, using a diffusely transmitting screen to provide a flat image that can be measured by an imaging photometer. This is a low cost, versatile solution in comparison to the traditional method of measuring lamp properties as a function of angle of emission, using Goniometers that are often costly and dedicated for one specific measurement.
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Scanning Electron Microscope (SEM)
Prisma E
Prisma E scanning electron microscope (SEM) combines a wide array of imaging and analytical modalities with new advanced automation to offer the most complete solution of any instrument in its class. It is ideal for industrial R&D, quality control, and failure analysis applications that require high resolution, sample flexibility and an easy-to-use operator interface. Prisma E succeeds the highly successful Quanta SEM.
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Electron Multiplication (EM) Standard Image Sensors
EM (Electron Multiplication) is a technology that uses on-chip gain in the charge domain to effectively eliminate read noise from an image sensor. This enables advanced ultra-low light applications that require extreme sensitivity at fast frame rates. Examples include life science applications such as single molecule detection, super resolution microscopy and spinning disk confocal microscopy along with physical science applications such as nanotechnology imaging, Bose Einstein condensates and soft X-ray spectroscopy, and astronomy applications such as adaptive optics and lucky imaging. The inclusion of an additional conventional output allows further flexibility for applications such as true 24 hour surveillance.
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Auger Electron Spectroscopy (AES)
Rocky Mountain Laboratories, Inc.
Auger Analysis, Auger Electron Spectroscopy (AES or Auger) is a chemical surface analysis method. AES measures the chemical composition of the outermost 100 Å of a sample. Measurements can be made at greater depths by ion sputter etching to remove surface layers.
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Electron Probe Microanalyzer
EPMA-1720
Both hardware and software incorporate the latest technologies to create the next generation of EPMA. New functions that offer simple and easy-to-understand operation have been added to the superb basic EPMA performance that Shimadzu has fostered over many years – high sensitivity, high accuracy, and high resolution – to allow the EPMA's capabilities to be exploited to the fullest. While easy enough for even novices to use, it also supports sophisticated analysis by experienced users.
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Scanning Electron Microscopy (SEM Analysis)
Rocky Mountain Laboratories, Inc.
Scanning Electron Microscopy (SEM Analysis) can produce images of almost any sample at magnifications of 15-300,000X. The SEM has tremendous depth of field allowing for imaging that cannot be accomplished using optical microscopy. Conductive and nonconductive samples can be imaged. When operated in the backscatter (BSE) detection mode, differences in material composition can be observed. Elemental analysis can be performed on any feature observed with an integrated Energy Dispersive Spectroscopy (EDS) detector.
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Beam Bender
10707A
The Keysight 10707A bends the incoming beam at a 90-degree angle and is designed for beam diameters of 6 mm or less . Includes a housing for standard mounting.
