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PED Systems
Pulsed Electron Deposition
Is a process in which a pulsed (80-100 ns) high power electron beam (~1000 A, 15 kV) penetrates approximately 1 μm into the target resulting in a rapid evaporation of target material. The non-equilibrium heating of the target facilitates stoichiometric ablation of the target material. Under optimum conditions, the target stoichiometry is preserved in the deposited films. All solid state materials – metals, semiconductors and insulators, including those transparent to laser wavelengths in PLD – can be deposited as thin films with PED. By combining PLD and PED, the range of complex materials that can be prepared as thin films can be greatly enhanced.
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Hi Rate Multi-Pixel Detection
Systems utilizing multiple electron beams are an emerging semiconductor metrology technology that aims to increase throughput. El-Mul is a pioneer in developing detection solutions for such metrology systems and has designed and manufactured prototype detectors that can simultaneously detect 144 beams at 35MHz.
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Electron Beam Lithography System
Spot type Electron Beam Lithography System JBX-8100FS achieved high throughput, small footprint and electric power saving.
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Electron Probe Microanalyzer
EPMA-8050G
This instrument is equipped with a cutting-edge FE electron optical system, which provides unprecedented spatial resolution under all beam current conditions, from SEM observation conditions up to 1 μA order. Integration with high performance X-ray spectrometers that Shimadzu has fostered through the company's traditions achieves the ultimate advance in analysis performance.
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Scanning Electron Microscopes
SEM
Scanning Electron Microscopes (SEM) scan a sample with a focused electron beam and obtain images with information about the samples’ topography and composition.
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Breakthrough compressors for the GDSII and MEBES formats
GDZip + MEZip
Recognizing the challenge to transfer, manipulate, and store the exponentially-increasing size of IC design files, Solution-Soft has developed gdzip and mezip, breakthrough compressors for the GDSII and MEBES formats used by the industry. The MEBES format is the most commonly used format for electron beam lithography and photomask production. The GDSII stream is the standard exchange format between the design world and the mask shops.
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Focused Ion Beam Scanning Electron Microscopes
FIB-SEMs
Combine imaging and analytical performance of a high resolution field emission scanning electron microscope (FE-SEM) with the processing ability of a next-generation focused ion beam (FIB).
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Light Sources
The unique dual-output of equivalent beams make it a useful source for many comparative applications in addition to wavelength calibration and so on. The two output beams originate from two views of the single emitting spot where the electron beam from the single hairpin filament collides with the interchangeable anode.
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Current Sensing Resistors: ACQ-200
TCS
These components are four-terminal. bus-bar, metal strip current shunts. Assembled using electron beam welding. These units can handle 15W of continuous power and a maximum current of 350A 90.1mohm). Also they can absorb a high pulse power rating and have very low inductance. They also feature excellent long term stability, less than 100ppm/C TCR, and have excellent frequency characteristics.
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XRT Source Brighthawk
The BRIGHTHAWK NT100 is a performance-leading microfocus X-ray tube comprising proprietary technology to achieve a high brightness output. The tube consists of a LaB6 crystal source for generation of the electron beam, a magnetic beam steering system, and a tungsten target for X-ray photon emission. The components are mounted in a precision-engineering housing and held at ultra-low vacuum levels for long-life performance. Following on from the successful 3rd generation tube, this 4th generation of tube across a wide energy range from 30 kV to 160 kV is highly configurable through a software interface to the internal control board, which is connected via an optical interface (through an Ethernet converter).
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TEM Lamella Preparation And Volume Imaging Under Cryogenic Conditions
ZEISS Correlative Cryo Workflow
ZEISS Correlative Cryo Workflow connects widefield, laser scanning, and focused ion beam scanning electron microscopy in a seamless and easy-to-use procedure. The solution provides hardware and software optimized for the needs of correlative cryogenic workflows, from localization of fluorescent macromolecules to high-contrast volume imaging and on-grid lamella thinning for cryo electron tomography.
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Space Flight Components
A tec, Inc. specializes in the design, manufacture, and integration of complex test systems and quality critical components. Our production engineering expertise separates us from other manufacturing companies when both reliability and cost are important. Atec has the best in 5 to 9 Axis CNC machining, coordinate measuring machines (CMMs), 3D additive metal and plastic printers, 9-Axis capable waterjet, cryogenic liquid flow test benches and environmental test chambers. We can deliver to the tightest tolerances and most exacting requirements. We can advise our customers on electron beam welding, friction joining, electronic test, environmental test, acoustics, vibration and many other technologies that can reduce manufacturing and operating costs. We are currently manufacturing liquid rocket engine fuel and oxidizer valves for multiple launch vehicles and have participated in 158 consecutive launch successes. Atec manufactured and tested advanced lithium-ion battery adapter plates that manage power for the International Space Station. Atec is designing, manufacturing, and testing power flow modules that work to prevent system failure on the human crew capsule (CCTS) that will transport astronauts to/from the ISS. Atec was awarded NASA Agency-Level Small Business Subcontractor of the Year , SBA Region VI Subcontractor of the Year for our support to NASA and Boeing and we were named a DCMA Top 500 Supplier.
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A Highly Versatile R&D Bell Jar Thin Film Coating System.
MODEL VES-3000
TEK-VAC's VES-3000 coater station model offers a modular concept for thin film deposition. Common PVD techniques which can be employed in this compact unit include thermal and electron beam evaporation. A 2KVA SCR controlled filament evaporation power supply is provided. Optional ion deposition and magnetron sputtering devices can be incorporated in the system.
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Streak Tubes
Streak tubes are the most important modules of streak cameras used for the study of ultra fast optical phenomena. The latter cameras are tools of critical importance in many areas of science and technology like studies of plasma/electric discharge/ combustion/laser ablation/ condensed matter phenomenon, in optical communications, electron beam acceleration technology, photochemistry, medicine, biology etc. Streak cameras have made possible a series of important scientific discoveries in earlier mentioned areas of science and technology. Precision information about parameters of streak tubes is needed both by manufacturer of such tubes in improve tube design and by users of these tubes to correct data generated by the tubes and make possible more accurate interpretation of output images.
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X-Ray Systems
X-ray and radioactive devices developed by AET, are widely utilized for medical, industrial and research use. The Compact Pulse X-ray Source can accelerate electron beams in a high-gradient electric field, to produce X-rays. Dose Calibrators are utilized for radioactive examinations and treatments in the medical industry.
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Magnetic Field Cancelling System
MR-3
3-axis magnetic field cancelling system for electron microscopes (SEM and TEM), electron and ion beam experiments, nanotechnology, biomagnetic investigations, etc. High reliability through rugged analog design. No tedious programming, no chrashs. More than 1000 MR-3 systems sold worldwide.
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Microscopy Software/Hardware
ZEISS Atlas 5
Atlas 5 is your powerful hardware and software package that extends the capacity of your ZEISS scanning electron microscopes (SEM) and ZEISS focused ion beam SEMs (FIB-SEM). Use its efficient navigation and correlation of images from any source, e.g. light- and X-ray microscopes. Take full advantage of high throughput and automated large area imaging. Unique workflows help you to gain a deeper understanding of your sample.
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Electron Sources
SPECS Surface Nano Analysis GmbH
To our customers in research and industry we offer a variety of sources for deposition, excitation and charge neutralization as well as analyzers and monochromators. Most of our sources originate from product lines which we have taken over from Leybold AG, Cologne, and from VSI GmbH. The X-ray monochromator Focus 500 and the UV monochromator TMM 302 are original developments by SPECS.Compliance with industry standards, a good price-performance ratio, stability, and longevity are the guidelines for our product development. We focus on standardized easy handling, user-friendliness, standardized software interfaces and safety.
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Beam Profiler
WinCamD series
CW & Pulsed laser profiling. Wavelength Range: 190 nm- 15 m*. Resolution: 5.0 m*. Smallest Beam: 42 m*.
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Beam Diagnostics
We offer camera-based devices with wavelength ranges from UV to IR. All are cameras are USB3.0, for the fastest data transfer rates.
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Electron Microscope Sample Preparation
Excellent sample preparation is the prerequisite for first-class electron microscopy. Be prepared – for great results in EM Sample Preparation! Perfect preparation makes the difference between trying and achieving, between failure and success, between results and excellent results. So be prepared for great results with Leica Microsystems!
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Ion & Electron Detection
Photonis is the global leader in the development and manufacturing of detectors and optical components to detect ions and electrons. These detectors and components have been designed for a wide range of scientific instruments used in space and research projects but also in cells and material analysis in lifescience or non destructive testing.
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Electron Probe Microanalyzer
EPMA-1720
Both hardware and software incorporate the latest technologies to create the next generation of EPMA. New functions that offer simple and easy-to-understand operation have been added to the superb basic EPMA performance that Shimadzu has fostered over many years – high sensitivity, high accuracy, and high resolution – to allow the EPMA's capabilities to be exploited to the fullest. While easy enough for even novices to use, it also supports sophisticated analysis by experienced users.
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Beam Load Cell
EST-70
Technopark Automation & Control
The EST-70 Shear Beam Load Cell is commonly used on platform, hopper weighing and pallet weighing applications. It is low cost and available in capacities from 500 kg to 2000 kg.
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Beam Bender
10726A
The Keysight 10726A bends the incoming beam at a 90-degree angle and is designed for beam diameters of 9 mm or less. This bare optic requires a user-supplied mount.
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Headlight Beam Testers
VLT offers a wide range of professional headlight beam testers. From simple manually operated models up to fullly automated robot type machines for use in integrated test lanes.
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Scanning Electron Microscopes
Our Scanning Electron Microscopes (SEMs) resolve features from the optical regime down to the sub-nanometer length scale.
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Beam Profiling
The beam propagation factor M2 is a common single parameter that charac-terizes the whole beam as it propagates through space. According to ISO standard 11146, this parameter could be defined by several measurement techniques based on beam profiling along several points of the propagating beam. The standard defines several measurement techniques, all of which are based on beam profiling measurements using devices such as cam-eras, knife edge and slits. There are two main measurement requierments - 1) Measurements of focused beams. 2) Measurements of collimated beams. Our M2 devices are capable of measurements of both laser types and due to their modular design interchangeable heads can be mounted in same M2 gear.
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Laser Beam Positioning
Under the trade name of SpotOn we offer a wide variety of computerized position measurement systems.This is a family of cost-effective and versatile solutions to numerous industrial and laboratory applications.Among the measurement applications, are:Measure laser power and centration or displacementAlign beams and QC of optical systemsMeasure target rotation and displacementMonitor vibration, deflection and motion
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UV-NIR Beam Profiler
CinCam
CINOGY Technologies CinCam is optimized to provide excellent sensitivity from the UV to NIR spectral range involving CCD/CMOS/InGaAs technologies. Thanks to its high resolution and its small pixel size, the CinCam ensures the highest accuracy in laser beam analysis of cw and pulsed laser systems. The plug and play design facilitates easy and flexible adaption to standard optical components.
