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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Scanning Electron Microscope
E5620
The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Detectors
Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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EUV Lithography
EXE systems
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Ultraviolet Checker
For magnetic particle testing. Intensity of ultraviolet can be read directly in mw/c directly.
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Ultraviolet Analyzers
Teledyne Analytical Instruments
Ultraviolet Analyzers by Teledyne Analytical Instruments
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Ultraviolet Meter
UVR Series
UVR series is suitable to manage lamp of ultraviolet curing equipment, Also suitable to measure intensity of ultraviolet ray for sun light and lamp.
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"Extremely Random" Precision Noise Generator
Model 3025
The Model 3025, "Extremely Random"TM Precision Noise Generator supplies White and Pink Noise, and a 1 kHz reference signal. Crystal controlled - the pseudo random circuitry provides a 6.5 Day pseudo-random cycle time, assuring a "Extremely Random"TM noise source.
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Light Microscopy
Materials Evaluation and Engineering
MEE has a variety of light microscopes with magnifications ranging from 5X to 2400X. Each microscope is connected to a camera with digital image capture for subsequent measurements and/or additional image analyses.
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Light Meters
TES Electrical Electronic Corp.
Dual Display, 4 digit LCD reading.Spectral Sensitivity close to CIE phototropic curve.Measuring levels ranging 0.001 to 1999kAccurate and instant response. Luminance ratio A/B
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Light Meters
Light Meters are used to measure the light output of an illumination source for a number of optical applications. Light Meters are measurement devices that feature photodiodes to determine the level of light transmitted from a source. Light Meters possess simple, easy to read screens upon which measurements are displayed in one or more photometric units. Most Light Meters possess traceable NIST certification for proof of accuracy.
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Light Meters
An instrument for measuring the intensity of light, used chiefly to show the correct exposure when taking a photograph.
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Light Microscopes
Compound light microscopes from Leica Microsystems meet the highest demands whatever the application – from routine laboratory work to the research of multi-dimensional dynamic processes in living cells.
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Timing Lights
A stroboscope used to dynamically set the ignition timing of an Otto cycle or similar internal combustion engine equipped with a distributor. Modern electronically controlled passenger vehicle engines require use of a scan tool to display ignition timing.
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Lighting Reliability
LED/OLED package lifetime is highly dependent on thermal management, and LED lamp performance can be dependent on the luminaire in which it is installed. Lighting reliability test system for LED/OLED Products are widely used for normal /accelerated aging, lumen maintenance measuring, lifetime evaluation and temperature characteristic testing for LED/OLED products including LED package, array, module, OLED module and luminaires.
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Light Sources
These external units provide illumination which is transmitted to the viewing instrument by a light guide cable, and then through the scope via the integral fiber bundle to the viewing tip.
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Light Shaping
VirtualLab Fusion supports light shaping by freeform surfaces, diffractive beam splitters and pattern generators, diffusers, and general arrays of micro-optical components, including, but not limited to, micro-lens arrays.
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Multi-Laser Light Source
LS-n
The LS-n is a customizable, compact fluorescence excitation source that provides up to four different laser wavelengths in a single combined output beam, with each laser individually controllable using ANF's custom software. An LS-4 unit (containing four lasers) is included with each standard NFM NanoFluorescence Microscope.
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Light Sources
Fiber optic light sources are a low-cost way to analyze and identify accurate fiber optic readings, while certifying optical fiber. Receive the ability to measure fiber optic light continuity, loss, and quality of the signal.
