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Plasma
An ionized gas used for flat panel displays.
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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Plasma Process Monitors
Plasma process monitors to monitor plasma emissions during semiconductor manufacturing processes such as etching, sputtering and CVD.
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Pure Boron Foils
MICROMATTER™ boron foils are also produced by laser plasma ablation; however, the deposition process is much more complex and time consuming than that for diamond-like carbon. Accordingly, only thin films, mainly designed for beam stripping of heavy ions in electrostatic accelerators, are available. All films are generally delivered on glass substrates coated with a release agent.
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Enable Non-Invasive Analysis
Sparklike Handheld™
Sparklike Handheld™ is practical and quick method to test IG gas concentration. Technology is based on plasma emission spectroscopy. A high voltage spark is launched in the IG unit's cavity causing a light emission which is observed and analyzed further.
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UV Plasma Sources
UVS300|UVS 10/35
The UVS300 and UVS 10/35 are UV Plasma sources with high intensity, working with different gases.
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Tailor-Made to Simulate Low-Temperature Plasma Sources and Systems
Plasma Module
The Plasma Module is tailor-made to model and simulate low-temperature plasma sources and systems. Engineers and scientists use it to gain insight into the physics of discharges and gauge the performance of existing or potential designs. The module can perform analysis in all space dimensions 1D, 2D, and 3D. Plasma systems are, by their very nature, complicated systems with a high degree of nonlinearity. Small changes to the electrical input or plasma chemistry can result in significant changes in the discharge characteristics.
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Standard CW Amplifiers
The BT-AlphaA-CW series is a range of classAB RF power amplifiers covering the 10kHz to1MHz frequency range.• Rugged, solid-state design - high reliability• Extremely high phase and amplitude stability• High linearity• In-Built Protection• Very fast blanking• Capable of pulsed operation• Competitively pricedSuitable for CW radar, communications, HF/VHF jamming, particle accelerator applications/plasma systems, plasma, RF heating and otherscientific applications.
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ICP-OES Spectrometers
ICP-OES spectrometers measure the concentration of elements from ppb to % using de-excitation of atoms and ions in a plasma. The robustness of our Ultima ICP spectrometers makes them ideal for applications common to mining, chemicals manufacture, salt production, wear metals in oil analysis, petrochemical, metallurgical production and precious metal refining.
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ICP-OES Analyzer
ARCOS
SPECTRO Analytical Instruments GmbH
For the most demanding elemental analyses in industry and research. ARCOS analyzer represents a new pinnacle of productivity and performance for inductively coupled plasma optical emission spectrometers. SPECTRO ARCOS excels in industrial and academic applications for the most advanced elemental analysis of metals, chemicals, petrochemicals, and other materials.
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One Port Vector Network Analyser
TE3001
The TE3001 One Port Vector Network Analyser is built for the professional who understands the calibration process and has a network analysis task to perform. The unit features a larger output signal than the TE3000 for better noise immunity, and is supplied with a 6 piece custom calibration kit to remove the effect of test fixtures and cables. Together, these features make the TE3001 ideal for broadcast and plasma applications that require a length of cable for connection and may be high in noise or interference.
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Principle Of Optical Emission Spectrometry
Optical emission spectrometry involves applying electrical energy in the form of spark generated between an electrode and a metal sample, whereby the vaporized atoms are brought to a high energy state within a so-called "discharge plasma".
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Spectrometers, Vacuum
A compact and versatile vacuum ultraviolet monochromator. A selection of aberration-corrected diffraction gratings is available so you can tailor the instrument to your wavelength of interest and application. Connect this instrument directly to your vacuum plasma physics experiment or build an intense UV tunable source. It is available as a scanning monochromator, as a spectrometer, or as a spectrograph with microchannel plate or direct-detection CCD. The Model 234/302 is popular in systems due to its compact design, high throughput and resolution. It is also available with an additional entrance or exit port.
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High Resolution Wavefront Sensor
Phasics wavefront sensor applies to laser beam measurement, wavefront correction through an adaptive optics loop, laser optics testing and plasma density measurement. Thus the single instrument offers true versatility to engineers and researchers in laser facility.
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Remote Plasma Sources
Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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Plasma Power Generators
Advanced Energy’s field-proven, Precision PowerTM solutions offer extreme control, peerless arc handling, and cutting-edge match technology. Unlock new fabrication processes and benefit from our plasma power generators’ comprehensive capabilities.
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R*evolution® Remote Plasma Source
The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
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Microwave Plasma Subsystems
AX2600 And AX2700
The AX2600 and AX2700 Microwave Plasma Delivery Subsystems are complete and highly reliable solutions for the cost-effective generation and safe delivery of atomic species to the wafer. Available in 3 kW, these highly reliable, field-proven plasma delivery subsystems deliver highly concentrated atomic species. Suitable for multiple chemistries, the high speed and precision of this plasma system’s automatic tuning guarantees immediate ignition and fast transition from plasma conditions for high productivity. Robust closed-loop control ensures high accuracy, precision, and optimal repeatability of the process from wafer to wafer and system to system.
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UV Cameras
Solar blind UV cameras are imaging devices optimized to detect ultraviolet light of wavelengths below about 280nm. Such cameras are insensitive against sunlight due to negligible sensitivity to visible and long wavelength UV light. Solar blind UV cameras are used in a series of applications like corona detection, fire detection, combustion analysis, plasma research, testing UV lamps, etc. However, highly sensitive corona detection is the main mass application and these devices are of crucial importance in electric power industry. These imaging devices enable easy detection of degraded insulators of high voltage transmission lines, distributions and substations. They can see the emission of UV light when discharges occur at defect insulators. From design point of view solar blind UV cameras are actually bispectral imaging systems built by combining true UV camera with typical visible camera. These bispectral imaging system generate output image as overlay of typical visible image with UV image of analyzed UV source.
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RF Plasma Generators
Choose from a broad range of RF plasma generators and access unique features for configuration, control, and application requirements. From various mounts and sizes to full digital control and plasma dynamic response, our RF generators can ignite your process innovation.
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Interferometers and Reflectometers for Plasma Diagnostics up to 170 GHz
Elva-1 supplies different solutions for measurement density and temperature profiles of plasma. Our systems are installed practically on all TOKAMAKs over the World.
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Post Dicing
Camtek offers dedicated inspection and metrology solutions for dicing-related processes, ensuring the reliability of the end product. Camtek developed new capabilities to address new dicing technologies such as Stealth and Plasma dicing using new algorithmic and technologies such as Back Light illumination, as well as various handling solutions.
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Remote Plasma Source
MAXstream
Advanced Energy’s MAXstreamTM line is the next generation of remote plasma sources for chamber cleaning. The MAXstream is available in 3, 6, 8, 10, and 12 SLPM NF3 flow rates to optimize price and performance.
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Inductively Coupled Plasma Spectrometry
Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Ideal Remote Plasma Source For Oxygen-Based Processes
Rapid OX
Reduce recombination effects and extend the lifetime of oxygen radicals thanks to Rapid OX's removable quartz liner. When compared to anodized chambers, the resultant reactive species extended lifetime improves photoresist strip rates. And because the quartz liner is easily installed or removed by the operator, it decreases downtime and significantly lowers replacement costs.
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In Situ Diagnostics
For researchers working on ultra thin films and novel interfaces, Neocera offers insitu, real-time process control and diagnostic tools such as high-pressure RHEED, Low Angle X-ray Spectroscopy (LAXS) and Ion Energy Spectroscopy (IES). RHEED provides exceptional growth control via RHEED intensity oscillations and the Structural data via diffraction. LAXS is a complimentary to RHEED and provides real-time Compositional information. IES provides energetics of the laser generated plasma plume which is directly responsible for obtaining high quality films and interfaces.
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Noise Location Package
Type HFDF
National RF’s Type HFDF high frequency location system is a proven noise hunting and location directional antenna system that allows you, in many cases, to walk right up to the source of High Frequency (HF) noise! Used by several power companies around the United States, professional noise hunters, and other communications specialists, the HFDF has located noise sources that emanated from pole power transformers, arcing electric fences, CATV in-line amplifiers, plasma TV screens, and even Marijuana grower’s heating lamps! The system incorporates several plug-in, tunable magnetic loop sensors of a proprietary National RF design, that cover the frequency range between 1.8 MHz and 55 MHz. The unit is packaged in a hand-held, lightweight metallic enclosure, with a pistol grip and a magnetic compass mounted on top. The compass is used to get magnetic bearings to the noise source, which may be plotted on a map to triangulate, and ultimately pin-point, the location of the noise source. In certain cases, our customers tell us that they have been able to walk right up to the interfering noise source and correct the situation on the spot!
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GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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Deep Ultraviolet Spectrophotometer System
VUVAS-10X
A new ultraviolet spectrophotometer system for optical metrology just arrived at NASA Goddard! The VUVAS-10X spectrophotometer works best in the 90 to 160 nanometer wavelength range, also known as deep or vacuum ultraviolet (VUV) region. It uses a windowless hydrogen plasma light source and differential pump section to reach many wavelengths beyond those of conventional deuterium lamps. The source also works with other gases, or gas mixtures, for atomic spectral line emission from about 30 nanometers (double ionized Helium gas) up to the Visible light range. The new spectrophotometer system, McPherson VUVAS-10X, uses a one-meter focal length high-resolution monochromator with the special light source, scintillated detector and Model 121 goniometric sample chamber. The system is ideal for optical transmission, absorbance and specular reflectance at incident angles up to 60 degrees. This McPherson spectrophotometer system will help develop, inspect and qualify optical materials and coatings used for very high altitude and extraterrestrial space flight missions.
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Nexis GC-2030 BIDUFRGA
UFRGA Series
The Ultrafast RGA system utilizes the new Barrier Discharge Ionization Detector (BID) technology coupled with Nexis GC-2030 to create new system GC for ultrafast, high-sensitivity analysis. Since the electrode creating Helium plasma is totally isolated from the carrier gas, there is no chance to contaminate this electrode with a dirty sample. This enables long-term stability.
