MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
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Product
Compact Networked I/O
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We offer networked I/O devices based on Ethernet, DeviceNet™, and Profibus for industrial control and automation applications.
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Product
High Accuracy In-Situ Mass Flow Verifier
HA-MFV
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The HA-MFV, High Accuracy Mass Flow Verifier is designed for use on process tools to verify mass flow control flow rates in-situ. Available with EtherCAT® or DeviceNet™ communications and measurement accuracy of 1.0% of reading, the HA-MFV can verify MFC flow with the actual process gas significantly better than older rate-of-rise devices or process chamber rate-of rise methods.
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Product
Reference Pressure Transducers
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These Baratron® capacitance manometers offer our highest level of presure measurement accuracy making them ideal for calibration transfer standards.
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Product
AA06A Baratron® Absolute Pressure Sensor
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AA06A Baratron® absolute pressure sensors are single-ended dual-electrode/AC bridge devices that are extremely stable and designed to minimize the effect of temperature changes. Full Scale ranges are available from 25,000 Torr down to 0.1 Torr. Each range measures down to 1 part in 106 Full Scale with selected percent Reading accuracy limited by this resolution and with accuracies ranging from 0.25% to 0.05% of Reading. They are constructed of Inconel® and stainless steel, allowing use with many wet, dirty, or corrosive gases.
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Product
Microwave Plasma Subsystems
AX2600 And AX2700
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The AX2600 and AX2700 Microwave Plasma Delivery Subsystems are complete and highly reliable solutions for the cost-effective generation and safe delivery of atomic species to the wafer. Available in 3 kW, these highly reliable, field-proven plasma delivery subsystems deliver highly concentrated atomic species. Suitable for multiple chemistries, the high speed and precision of this plasma system’s automatic tuning guarantees immediate ignition and fast transition from plasma conditions for high productivity. Robust closed-loop control ensures high accuracy, precision, and optimal repeatability of the process from wafer to wafer and system to system.
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Product
Chemical Downstream Plasma Source
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The AX7610 is a microwave plasma source for remote plasma applications. With replaceable quartz or sapphire plasma tubes, the AX7610 downstream source offers configuration flexibility to meet the most demanding application process parameters. The quartz tube version is ideally suited for production of atomic oxygen, nitrogen or argon. The sapphire tube version is compatible with much more severe CF4 CHF3 and NF3 chemistries.
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Product
IP66 Rated Mass Flow Controllers
I-Series
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I-Series Thermal Mass Flow Controllers are designed specifically for mass flow controller applications in harsh environments to protect against water and dust. The IP66-rated enclosure for I-Series Mass Flow Controllers protect it from direct water spray as well as dusty environments.
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Product
Industrial Absolute Pressure Transducers
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These industrial Baratron® capacitance manometers feature absolute pressure measurement, industrial enclosures, and higher operating temperature ranges for industrial applications.
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Product
High Performance Baratron® Absolute Pressure Transducers
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These high performance Baratron® capacitance manometers operate at ambient temperature. They are referenced to vacuum for gas independent, direct measurement of absolute pressure.
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Product
Process Automation Controllers
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As innovators in programmable control, communication protocols, embedded analytics, and gateway technology, MKS has the critical building blocks and experience to deliver the latest technologies for distributed automation control and process monitoring to our customers, personalized for their exact requirements.
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Product
Vapor Mass Flow Controllers
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Heated pressure-based mass flow controllers are designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas.
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Product
Vacuum Pressure Sensors
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MKS, Granville-Phillips® Vacuum Gauges & Sensors cover a broad spectrum of vacuum measurement solutions.
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Product
Vacuum Quality Monitor Systems
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The 835 VQM is a mass spectrometer that operates from UHV to 10-5 Torr and accurately measures the gases in the vacuum chamber. The 835 VQM Differential Pump System delivers the advantages of the 835 VQM at higher pressures. The VQM system consists of an autoresonant ion trap mass spectrometer gauge, a VQM Controller and VQM Viewer software that that converts raw data into actionable information. The system is ratiometric, meaning that it determines the ratio of each gas to other gases in a vacuum chamber. It is usually coupled with a total pressure gauge to provide partial pressures of each gas as indication of the quality of the vacuum in the chamber.
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Product
Remote Plasma Sources For Process Applications
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MKS remote plasma sources deliver high density reactive radicals improving on-wafer cleaning and deposition throughput. Solutions consist of a fully integrated, self-contained unit designed for quick on-chamber installation providing fast, reliable plasma ignition of O2, Hydrogen and Nitrogen gases in a customer configurable package. All solutions are equipped with intelligent power control and EtherCAT® diagnostics supporting Industry 4.0.
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Product
Mass Flow Controllers
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Enabling Productivity Through Flow Control Innovation. Our wide range of mass flow controllers are available in thermal and pressure based sensor technologies, analog and digital communication, and metal or elastomer seals.


















