MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
Categories
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Dissolved Ammonia Delivery System
DI-NH3
MKS' DI-NH3 is a compact, stand-alone system providing dissolved ammonia water. With Semiconductor 3D IC architectures using new materials like Cu-Co and Si-SiGe, the ability to wet clean with precise alkaline chemistries is growing in frequency and importance. The DI-NH3 delivers dissolved ammonia, providing optimal cleaning capability in an alkaline chemistry, minimizing material loss and contamination and inhibiting Electrostatic Discharge (ESD). Using closed-loop control, conductivity and pressure are kept stable under changing flow conditions. The dissolved ammonia concentration is monitored and adjusted, delivering the specific NH4OH concentration needed. Dissolved ammonia’s alkaline chemistry provides ESD protection during rinsing, particle lift-off, and residual photoresist removal in middle-of-line (MOL) and prevents corrosion of cobalt/copper interfaces.
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Communication Gateways
We offer compact gateways for DeviceNet™, Profibus™ and Ethernet communication protocols available in RS232, RS422, RS485 and Modbus interfaces for communicating with our programmable automation controllers and networked I/O.
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Baratron® Isolation Systems
These Isolation Systems are designed to automatically maintain a heated Baratron® capacitance manometer at vacuum throughout a process cycle. Maintaining a heated Baratron® capacitance manometer at vacuum is one of the most important ways to optimize its accuracy and repeatability in production systems, making this product especially well-suited for fast-cycling industrial and semiconductor manufacturing processes.
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Mass Spectrometers
Our wide range of powerful, versatile, and proven mass spectrometry-based solutions deliver a new level of understanding and control in vacuum and gas-related applications to customers.
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Reference Pressure Transducers
These Baratron® capacitance manometers offer our highest level of presure measurement accuracy making them ideal for calibration transfer standards.
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Vacuum Quality Monitor Systems
The 835 VQM is a mass spectrometer that operates from UHV to 10-5 Torr and accurately measures the gases in the vacuum chamber. The 835 VQM Differential Pump System delivers the advantages of the 835 VQM at higher pressures. The VQM system consists of an autoresonant ion trap mass spectrometer gauge, a VQM Controller and VQM Viewer software that that converts raw data into actionable information. The system is ratiometric, meaning that it determines the ratio of each gas to other gases in a vacuum chamber. It is usually coupled with a total pressure gauge to provide partial pressures of each gas as indication of the quality of the vacuum in the chamber.
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R*evolution® Remote Plasma Source
The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
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Microwave Generators And Systems
MKS offers compact industrial microwave generators and systems in 915MHz and 2450MHz that are adaptable to a wide range of applications including include Food and Beverage Packaging, Environmental and Advanced Industrial processes like coating, material growth, and automotive. With a robust, modular power system chassis design and advanced filament and electromagnetic management, MKS microwave generators are engineered to last. The microwave generators are equipped with switch mode topology for all power ranges and support a variety of fieldbus communication protocols.
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Stand-alone Ozone Delivery System For Advanced Processes
SEMOZON® AX8585
SEMOZON® AX8585 stand-alone ozone gas delivery system is designed around the AX8410 PRIME ozone generator to provide high flow, high concentration, ultra clean ozone generation and delivery. This fully configurable product line is designed to meet the ever changing needs of the semiconductor industry. Each SEMOZON AX8585 is a fully integrated, high output ozone gas delivery system intended for use in an increasing number of semiconductor process applications such as ALD, CVD, TEOS/Ozone CVD, photoresist strip, wafer cleaning, contaminant removal, and oxide growth.
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Remote Plasma Sources
Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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Vacuum Gauge Controllers
MKS offers a range of controllers that control ion gauges, heat-loss sensors, and thermocouples. Product features can be configured to meet your specific process needs. A variety of communication protocols, including RS-232, RS-485, and DeviceNet™, are available to speed and ease integration into your control scheme. In addition, many of the controllers provide local displays and a choice of set points that further simplify control system integration.
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Compact Pressure Transducers And Switches
Compact Baratron® capacitance manometers are ideal for space constrained applications. Compact pressure transducers provide an analog output proportional to pressure, while compact pressure switches provide a relay output based on pressure.
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Compact Networked I/O
We offer networked I/O devices based on Ethernet, DeviceNet™, and Profibus for industrial control and automation applications.
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Remote Plasma Sources For Process Applications
MKS remote plasma sources deliver high density reactive radicals improving on-wafer cleaning and deposition throughput. Solutions consist of a fully integrated, self-contained unit designed for quick on-chamber installation providing fast, reliable plasma ignition of O2, Hydrogen and Nitrogen gases in a customer configurable package. All solutions are equipped with intelligent power control and EtherCAT® diagnostics supporting Industry 4.0.
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Process Sense™ NDIR End Point Detector For Chamber Clean
The Process Sense endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). It gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.


















