Inductively Coupled Plasma
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Inductively Coupled Plasma Spectrometry
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Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Optical Emission Spectrometer
EXPEC-6000
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An analytical technique used to determine how much of certain elements are in a sample.
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Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
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With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
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Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
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Industry-leading performance, speed and ease of use – no compromises
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Inductively Coupled Plasma
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Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
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ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
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Chemical Analysis and Corrosion Testing
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Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
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Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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ICP Plasma System
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The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Coupling Decoupling Network
TBCDN-M2
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The TBCDN-M2 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
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Inductive sensors
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Inductive sensors are signal generators which detect function-related movements of processing machines, robots, production lines, conveyor systems etc. in a contactless fashion, and transform them into electrical signals.
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Inductive Heater
BD-1.01
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The device is assigned to heat the bars to the state, which allows upsetting. The DB-1.01 heater characterizes especially high watt-hour efficiency (bigger than 98%) thanks to suitable concentration of electromagnetic field in the heating zone of inductor (the solution secured by patent). It is possible to addapt the nductive heater BD-1.01 for heating any others bars.
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Plasma Processing Systems
PlasmaSTAR
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The PlasmaSTAR® Series of Plasma Processing Systems from Axic, Inc. defines a new concept in barrel plasma processing. The systems are based on a modular design concept. Starting with a universal base unit, multiple electrode modules are available for easy insertion into the base unit. You will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma.
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CDN - Coupling / Decoupling Networks
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The Coupling- / Decoupling Networks are used to inject common mode disturbances to Equipment under Test (EuT). Further the CDNs provide sufficient decoupling between Auxiliary Equipment (AE) and disturbance signal. The requirements for CDN and their application are described in the standard IEC 61000-4-6 (Immunity to conducted disturbances, induced by radio-frequency fields). CDNs have a common mode impedance of 150 Ohm and are available for a multitude of cable types and connectors.
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RF Plasma Power Systems
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These are ideal solutions for plasma apps like etching, cleaning, deposition and more
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Coupled Cavity TWTs
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Communications & Power Industries
• Frequencies from 2.7 to 37.5 GHz• Peak levels: 500 W to 180 kW• Cooling type: air, liquid, conduction• Depressed or grounded collectors• CW (Continuous Wave) and Pulsed
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High Power Microwave Plasma System
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The High Power Microwave Plasma System features the High Power Microwave Plasma Source, generator (with isolator) and auto-tuning system comprised of the Precision Power Detector and SmartMatch® unit. This comprehensive system delivers a high concentration of radicals with low electron temperatures for the highest dissociation and lowest recombination rates.
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Fail-Safe Inductive Sensors
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*Certification to EN 60947-5-3 for electromechanical controlgear*Ensuring operator and machine safety*No special actuator for electronic fail-safe sensors required*Connection to safety plc or safe AS-i module*Series connection of sensors and contacts possible
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Plasma Power Generators
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Advanced Energy’s field-proven, Precision PowerTM solutions offer extreme control, peerless arc handling, and cutting-edge match technology. Unlock new fabrication processes and benefit from our plasma power generators’ comprehensive capabilities.
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Micro-size Inductive Proximity Sensor
GXL
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Panasonic Industrial Devices Sales Company of America
Panasonic cube-shaped GXL Micro-Size Inductive Proximity Sensors are extremely small. Each Sensor is available in four different versions: front or side sensing with normally open or normally closed contacts and offering two detection frequencies to prevent mutual interference.Characteristics
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Unclamped Inductive Load Tester
ITC55100C
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The system has been designed around a very powerful micro-controller that gives it a timing resolution of 40ns, twenty times faster than the previous model. Its response time to the peak and zero current is improved ten times. Combined this gives greater accuracy for the charging and avalanche times and for the reported peak drain current.
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Digital Displacement Inductive Sensor
EX-V Series
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High-speed, high-accuracy, digital inductive displacement sensors with sub-micron resolution and an ultra-fast 40,000 samples/sec. sampling rate. Automatic Bottom-dead-center measurement mode. High-speed sampling : 40,000 samples/second. Digital Inductive Displacement Sensor
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Inductive Proximity Sensors (Round)
SP1
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● Easy installation, high-speed pulse generator, high-speed rotation control, and more.● A wealth of models ideal for limit control, counting control, and other applications.● Sensing distance from 0 ~ 4 ~ 6/ ~ 20mm● Housing by PBT with strong structure and acid resisting.
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Inductive Load Banks
L-Series
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L-series inductive load banks are devices which contain inductive loads, apply the load to an electrical power source and dissipate the reactive power of the electrical source. L-series load banks are designed for portable and fixed applications. Hilkar brand L-series load banks have robust design and are specifically designed for corrosive environments. Load banks can be controlled via local, remote, wireless remote or automatic control systems.
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Inductive Sensors
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Our hygienic sensors are extremely durable against abrasive and aggressive media: their labeling is resistant to abrasion and chemicals. The luminous displays are protected against destruction and the housing construction is optimized for safe cleaning.
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RF Plasma Generators
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Choose from a broad range of RF plasma generators and access unique features for configuration, control, and application requirements. From various mounts and sizes to full digital control and plasma dynamic response, our RF generators can ignite your process innovation.
