Focused Ion Beam
A scanning electron microscope with the electron source replaced by a gallium ion gun. Used for fault analysis and modification of modern microchips and semiconductor devices. (http://www.empa.ch)
See Also: Beam
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Product
Focused Ion Beam Scanning Electron Microscopes
FIB-SEMs
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Combine imaging and analytical performance of a high resolution field emission scanning electron microscope (FE-SEM) with the processing ability of a next-generation focused ion beam (FIB).
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Sputtering Systems
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Known for precision and cleanliness, Veeco Ion Beam Sputtering (IBS) systems are ideal when engineers need tight control over film thickness, composition, and optical performance. Using a focused ion beam, IBS dislodges atoms from a target, depositing them onto a surface in smooth, ultra-uniform layers.
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Product
TEM Lamella Preparation And Volume Imaging Under Cryogenic Conditions
ZEISS Correlative Cryo Workflow
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ZEISS Correlative Cryo Workflow connects widefield, laser scanning, and focused ion beam scanning electron microscopy in a seamless and easy-to-use procedure. The solution provides hardware and software optimized for the needs of correlative cryogenic workflows, from localization of fluorescent macromolecules to high-contrast volume imaging and on-grid lamella thinning for cryo electron tomography.
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Etch System
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When it comes to clean etches, Veeco’s Ion Beam Etch (IBE) systems deliver with sharp control and minimal disruption. Using a focused argon ion beam, this subtractive technique etches nanoscale features with precision, making it a go-to for pattern transfer, layer removal, and surface refinement where edge definition matters most.
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Microscopy Software/Hardware
ZEISS Atlas 5
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Atlas 5 is your powerful hardware and software package that extends the capacity of your ZEISS scanning electron microscopes (SEM) and ZEISS focused ion beam SEMs (FIB-SEM). Use its efficient navigation and correlation of images from any source, e.g. light- and X-ray microscopes. Take full advantage of high throughput and automated large area imaging. Unique workflows help you to gain a deeper understanding of your sample.
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Product
33% Beam Splitter - BK7, fixed horizontal-bend mount
E1834E
Beam Splitter
The E1834E is a 33% beam splitter in a high performance horizontal mount that offer the high pointing stability for Keysight laser interferometer measurement system. The 8 flexure feet are designed for stable beam pointing.
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Product
50% Beam Splitter BK7, Fixed Horizontal-Bend Mount
E1834G
Beam Splitter
The E1834G is a 50% beam splitter in a high performance horizontal mount that offer the high pointing stability for Keysight laser interferometer measurement system. The 8 flexure feet are designed for stable beam pointing.
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Product
67% Beam Splitter BK7, Fixed Horizontal-Bend Mount
E1834J
Beam Splitter
The E1834J is a 67% beam splitter in a high performance horizontal mount that offer the high pointing stability for Keysight laser interferometer measurement system. The 8 flexure feet are designed for stable beam pointing.
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Product
33% Beam Splitter
10700A
Beam Splitter
The Keysight 10700A beam splitter is designed for beam diameters of 6 mm or less. It reflects one third of the total incoming laser beam, and transmits two thirds. It includes a housing for standard mounting.
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Product
Beam Bender
10707A
Beam Bender
The Keysight 10707A bends the incoming beam at a 90-degree angle and is designed for beam diameters of 6 mm or less . Includes a housing for standard mounting.
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Product
Beam Bender
10726A
Beam Bender
The Keysight 10726A bends the incoming beam at a 90-degree angle and is designed for beam diameters of 9 mm or less. This bare optic requires a user-supplied mount.
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Product
15% Beam Splitter
10725C
Beam Splitter
The 10725C 15% beam splitter, designed for beam diameters of 9 mm or less, reflects 15% of the total incoming laser beam and transmits 85% straight through. This optic is without housing and requires a user-supplied mount.
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Product
50% Beam Splitter
10701A
Beam Splitter
The Keysight 10701A beam splitter is designed for beam diameters of 6 mm or less. It reflects one half of the total incoming laser beam, and transmits one half. The Keysight 10701A optic includes a housing for standard mounting.
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Ion Chromatography
940 Professional IC Vario
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High-end ion chromatography system for research applications and method development
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Ion Chromatography
Metrohm IC Driver 2.1 for Empower®
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Software drivers for integrating Metrohm IC instruments in "Empower® 3" made by Waters. One license per computer authorizes the operation of IC systems under "Empower® 3".
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Product
Beam Bender BK7, Fixed Horizontal-Bend Mount
E1834M
Beam Bender
The E1834M is a beam bender that bends the incoming beam at a 90-degree angle and is designed for beam diameters of 9 mm or less. This referenced optics uses high performance horizontal mount to deliver laser beam throughout a measurement system. The 8 flexure feet are designed for stable beam pointing.
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Ion Beam Milling Systems
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When material specimen surfaces are prepared for SEM or incident light microscopy, the specimen usually undergoes multiple processes until the layer or surface to be analyzed is machined with precision. Leica Microsystems’ workflow solutions for solid state technology cover all steps required for demanding high-quality sample preparation.
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Beam Probes
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The CO2 Laser Beam Probes are hand-held plates designed to simplify the alignment of IR optical systems. They display the laser beam as a dark image on a fluorescent background using the same UV-excited, thermal-sensitive surfaces developed for Macken Instruments'' Thermal Image Plates.
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Ion Chromatography
Eco IC
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Discover Eco IC, an ion chromatography system that focuses on the essentials while not compromising on quality, robustness, and reliability. Eco IC has been developed to enable more users to benefit from this technique. Whether you need to perform routine water analysis or you’re looking for an instrument for higher education, Eco IC comes with all the components you need. In addition, you can also save time and reduce work by getting an automated system.
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Ion Beam System
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Veeco's unmatched Ion Beam know-how delivers proven etch and deposition performance enabling the data storage and MEMS markets for decades.
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Beam Profiler
WinCamD series
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CW & Pulsed laser profiling. Wavelength Range: 190 nm- 15 m*. Resolution: 5.0 m*. Smallest Beam: 42 m*.
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Entry Level Beam Profiling
BeamMic®
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BeamMic is simplified set of measurement tools for the entry level beam analysis user. The camera-based beam profiling system consists of a camera and analysis software. Often times, this system will need to be used with beam attenuation or beam sizing accessories, depending on your laser application. BeamMic includes a complete set of high-accuracy measurements, and features a rich graphical interface. For the laser technician, this entry-level software will easily help you quickly become familiar with the many benefits of beam profiling.
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Beam Pattern Measurement System
BP100
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The BP100 is purpose-made for luminous intensity measurement of lamps, using a diffusely transmitting screen to provide a flat image that can be measured by an imaging photometer. This is a low cost, versatile solution in comparison to the traditional method of measuring lamp properties as a function of angle of emission, using Goniometers that are often costly and dedicated for one specific measurement.
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Gridded DC Ion Sources
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Ion-assisted processes like sputtering, etching, and surface treatment depend on a beam that’s stable, uniform, and tightly controlled. Gridded DC ion sources make that happen, giving engineers the precision they need to fine-tune ion energy and current density for reliable results.
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Cold Atomic Beam System
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Detailed description of item: Complete cold atomic beam sources for alkaline-earth precision experiments and atomic devices. Small chambers with patented permanent-magnet Zeeman slowers and in-vacuum 2D MOT optics allow high flux with low outgassing and no thermal beam flux at the cold atom port, which provides a CF-133 connection to customer vacuum chamber. Advanced thermal design of the effusion oven allows long-lifetime operation at minimal heating power, with no water cooling. An integrated low-outgassing hot window is provided for coupling of on-axis Zeeman cooling light. Ion and getter pumps integrated into the chamber manage outgassing from the oven at temperatures up to 520 °C. Operating baseline pressures below 1×10-11 mbar can be attained in the customer’s downstream cold atom (typically 3D MOT) science chamber, with suitable pumping speed provided at the differentially-pumped cold beam output port.
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Laser Beam Alignment
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The alignment product line provides full solutions for applications such as: alignment of laser cavities, straightness measurement, machine alignment, wide-bed printers alignment and others. The AlignMeter system simultaneously measures incoming laser beam position (in µm) and angle (in µRad).It is a powerful compact device perfect for alignment monitoring, for testing the drift, centration and beam alignment relative to the outer housing or tube.
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Electron Beam Lithography System
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Spot type Electron Beam Lithography System JBX-8100FS achieved high throughput, small footprint and electric power saving.
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50% Beam Splitter
10725A
Beam Splitter
The 10725A 50% beam splitter, designed for beam diameters of 9 mm or less, divides the beam into equal parts. It transmits one part straight through, and bends the other part at a 90-degree angle. This optic is without housing and requires a user-supplied mount.
