MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive,
Suite 201
Andover, MA 01810
United States of America
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High Accuracy In-Situ Mass Flow Verifier
HA-MFV
The HA-MFV, High Accuracy Mass Flow Verifier is designed for use on process tools to verify mass flow control flow rates in-situ. Available with EtherCAT® or DeviceNet™ communications and measurement accuracy of 1.0% of reading, the HA-MFV can verify MFC flow with the actual process gas significantly better than older rate-of-rise devices or process chamber rate-of rise methods.
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Multi-Channel Ozone Delivery System With In-rack Chiller
SEMOZON® AX8575
The SEMOZON® AX8575 is a fully integrated, high output ozone gas delivery system that can be configured as a multi-channel system delivering ozone for up to 4 channels supporting multiple chambers or multiple tools. It has an optional in-rack chiller for ultra-high concentrations.
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High Temperature Absolute Pressure Transducers
Our high temperature Baratron® capacitance manometers are controlled to temperatures of 150°C or higher for use use in demanding semiconductor manufacturing vacuum processes such as metal etching and nitride film chemical vapor deposition (CVD).
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DELTA™ III 3-zone Flow Ratio Controller
The DELTA™ III Flow Ratio Controller divides and controls mixed process gas flows to three chambers or zones within a process chamber at proportions specified by the user to optimize process uniformity and repeatability. Available with EtherCAT® or DeviceNet™ communications, this device provides the latest in gas flow ratio measurement and control technology.
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Industrial Differential Pressure Transducers
These industrial Baratron® capacitance manometers feature differential pressure measurement, industrial enclosures, and higher operating temperature ranges for industrial applications.
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General Performance Absolute Pressure Switches
These absolute vacuum / pressure switches offer fast, accurate, and reliable protection for vacuum equipment and processes. Designed for applications where a DC signal output is not required, these pressure switches provide relay outputs that are readily interfaced with alarms, valve actuators, computers, process controllers, or other protection devices.
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Remote Plasma Sources For Process Applications
MKS remote plasma sources deliver high density reactive radicals improving on-wafer cleaning and deposition throughput. Solutions consist of a fully integrated, self-contained unit designed for quick on-chamber installation providing fast, reliable plasma ignition of O2, Hydrogen and Nitrogen gases in a customer configurable package. All solutions are equipped with intelligent power control and EtherCAT® diagnostics supporting Industry 4.0.
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DELTA™ IV 4-zone Flow Ratio Controller
DELTA™ IV 4-zone Flow Ratio Controller is a digital controlled, browser-enabled, process control instrument providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution for semiconductor, flat panel, and solar panel process uniformity and control. It is available in EtherCAT® or DeviceNet™ providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution.
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PRIME Ultra Clean, Ultra High Concentration, Ultra High Flow Ozone Generator
SEMOZON® AX8410
The SEMOZON® AX8410 PRIME is the initial product offering in MKS' next generation platform of compact, high concentration, high flow, ultra clean ozone generators. It features a newly designed cell and power structure to achieve twice the ozone output of earlier models with a similar footprint.
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Ultra Clean, High Concentration, High Flow Ozone Generator
SEMOZON® AX8415
The SEMOZON® AX8415 is the most innovative and versatile ozone generator developed by MKS. Ultra clean, high concentration, high flow ozone is produced by this generator's novel architecture and patented cell design, converting oxygen to >400 g/Nm3 of high concentration ozone for leading-edge applications in the semiconductor, flat panel display and photovoltaic industries.
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2450 MHz Industrial Microwave Generators
Alter® 2450 MHz Industrial Microwave Generators are built on MKS Alter® Product experience and designed with rugged and reliable switch mode power supplies for demanding industrial applications. They offer compact generators up to 3kW in a 19 inch standard rack with a remote head and integrated isolator.
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AA06A Baratron® Absolute Pressure Sensor
AA06A Baratron® absolute pressure sensors are single-ended dual-electrode/AC bridge devices that are extremely stable and designed to minimize the effect of temperature changes. Full Scale ranges are available from 25,000 Torr down to 0.1 Torr. Each range measures down to 1 part in 106 Full Scale with selected percent Reading accuracy limited by this resolution and with accuracies ranging from 0.25% to 0.05% of Reading. They are constructed of Inconel® and stainless steel, allowing use with many wet, dirty, or corrosive gases.
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Automation Controllers And Modules
Our complete automation platform solution along with a suite of automation control hardware and software configurable modules allow semiconductor and other industrial manufacturing customers to better automate their processes through computer-controlled automation and seamlessly integrate with existing MKS products to provide a complete solution.
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Compact Networked I/O
We offer networked I/O devices based on Ethernet, DeviceNet™, and Profibus for industrial control and automation applications.
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Advanced IR Gas Analyzer For Process Monitoring
T-Series
T-Series Inline Gas Analyzer improves gas measurement accuracy over the traditional non-dispersive infrared (NDIR) analyzers using Tunable Filter Spectroscopy (TFS™), a spectroscopic scanning technique capable of generating slices of spectra in the infrared region. Each scan produces an absorption spectrum which is used to identify compounds and provide concentration values. TFS technology improves gas identification accuracy and selectivity by subtracting out spectra from interferent gases within the same infrared regions. This spectral processing capability also provides multi-component measurement.