Metrology
field of measurement.
See Also: Measurement, Instrumentation, Coordinate Measuring Machines
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Metrology
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KLA’s metrology systems address a range of chip and substrate manufacturing applications, including verification of design manufacturability, new process characterization and high volume manufacturing process monitoring. By providing precise measurement of pattern dimensions, film thicknesses, layer-to-layer alignment, pattern placement, surface topography and electro-optical properties, our comprehensive set of metrology systems allows chip manufacturers to maintain tight control of their processes for improved device performance and yield.
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Product
Metrology System
Aspect
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Memory density increases with both layer-pair scaling and tier stacking for memory stacks well over 200 pairs. The Aspect metrology system was designed with these future architectures and scaling strategies in mind. Aspect metrology is demonstrating performance superior to X-ray systems across multiple customer devices through a revolutionary infrared optical system providing full profiling capability to enable critical etch and deposition control, with the speed and process coverage that customers require.
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Dimensional Metrology System
PINNACLE PLUS
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Pinnacle+ Plus elevates Pinnacle performance to the next level. Pinnacle+ Plus features a rigid granite optical support structure and a high performance Z-axis motion assembly to produce the lowest possible uncertainty on micro-electronic parts and assemblies/
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Optical Metrology
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Complex measurements can be performed quickly and easily with optical measuring solutions from ZEISS. With a high degree of automation and state-of-the-art sensors, they reduce operating errors and guarantee high measuring accuracy.
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Optical Metrology
YieldStar
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Our YieldStar optical metrology solutions for the semiconductor industry can quickly and accurately measure the quality of patterns on a wafer.
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Warpage Metrology System
TableTop Shadow Moiré (TTSM)
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Measure warpage of substrates up to 300mm x 310 mm (a 300mm wafer or two JEDEC trays) with the entire measurement taking less than two seconds. Whether individual parts or a JEDEC tray of multiple parts, the TTSM provides an ultra-fast and highly accurate measurement at room temperature that is suited for tabletop use.
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Rotational Metrology System
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The ZeroTouch® Rotational Metrology System is a precise, high-speed, in-line or near-line metrology, and inspection system that measures critical dimensions of rotors, stators, brake discs, and other cylindrical parts, providing manufacturers with real-time metrology, and inspection data to optimize production processes, detect defects, and improve ROI.
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Scatterometers / Thin film Metrology Systems
Olympian Series
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DUV-Vis-IR (Wavelength Range: 190nm – 15,000nm) Scatterometers / Thin Film Metrology Systems: The n&k Olympian, n&k Olympian-450 and n&k Olympian-M are DUV-Vis-IR scatterometers/thin film metrology systems with micro-spot technology, covering the wavelength range from 190nm – 15,000nm. With the inclusion of the infra-red wavelength range, the Olympian Series extends the capabilities of n&k’s DUV-Vis-NIR scatterometer series – the OptiPrime-CD Series.
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Metrology Device
XPLOR 100
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XPLOR 100 is a state of the art, fully automated metrology device designed for measurement and analysis of bubbles and inclusions for optical substrates in the Visible and NIR wave-bands.
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Digital Readouts & Metrology Tools
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HEIDENHAIN digital readouts have universal applications. In addition to standard tasks on milling, drilling and boring machines and lathes, they also can be used with machine tools, measuring and testing equipment, and special machines in fact, they can be used with any machine where axis slides are traversed manually.
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Benchtop Models For Best Film Metrology
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Fixed, high-precision laboratory instruments used to accurately measure properties like film thickness, refractive index, and roughness.
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Linear Metrology System
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The ZeroTouch® Linear Metrology System is a high-speed, non-contact linear inspection system ideal for measuring linear-shaped parts such as hip stems and aerospace blades faster than traditional methods.
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Photovoltaic/Solar Metrology System
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Multi-channel thickness, TTV and bow measurement module for in-process monitoring of solar/photovoltaic wafers and other materials.
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High Precision 3D Metrology
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Ensure zero-defect quality in all product deliveries and boost customer satisfaction: ISRA’s precision metrology systems measure all object and surface properties down to the nanometer level while ensuring the shortest cycle times.
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Scatterometers / Thin Film Metrology Systems
OptiPrime Series
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The n&k OptiPrime series are automated metrology systems used to fully characterize and monitor Thin Film and OCD applications for both current and next generation IC processes.
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Product
Metrology
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Rosenberger Hochfrequenztechnik GmbH & Co. KG
Network analyzers are used to measure so-called scatter parameters (S-parameters). These describe the behaviour of electrical components with the help of wave magnitudes. Whether simple cables, filters, amplifiers or complex subsystems, the following applies to all these components: Different loads can have unseen effects on the measured values over time.
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Materials Metrology
VeraFlex Family
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World-class XPS and XRF metrology technologies for semiconductor process control.
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Portable Metrology‑Grade 3D Scanner
Black Series
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The HandySCAN 3D | BLACK Series delivers accurate, high-resolution and repeatable results, regardless of the measurement setup quality and no matter the user experience. Featuring dynamic referencing, both the scanner and part can move during measurement and still provide an accurate and high‑quality scan.
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Metrology & Inspection Systems
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Our optical and e-beam wafer metrology and inspection products quickly and accurately measure pattern quality before and during high-volume chip manufacturing.
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Automated Metrology System
EVG®50
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High-throughput, high-resolution metrology for bonded stacks and single wafers. The EVG 50 (fully automated stand-alone tool) and the Inline Metrology Module (integrated in EVG''s high-volume manufacturing systems) offer highly accurate measurements at high speed, utilizing different measurement methods for a large number of applications. The tool''s application range covers multi-layer thickness measurements for determination of the total thickness variation (TTV) of an intermediate layer, the inspection of bond interfaces as well as resist thickness measurement, and meets the most demanding requirements of the yield-driven semiconductor industry.
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Benchtop Metrology Solution
FilmTek 2000 PAR-SE
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Scientific Computing International
Our most advanced benchtop metrology solution, engineered to meet the needs of nearly any advanced thin film measurement application, from R&D to production. Combines spectroscopic ellipsometry and DUV multi-angle polarized reflectometry with a wide spectral range to deliver the highest accuracy, precision, and versatility in the industry. Patented parabolic mirror technology allows for a small spot size down to 50µm, ideal for direct measurement of product wafers and patterned films.
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Metrology Search Engine
Qualer Search
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Qualer Search is the first metrology search engine that enables you to find potential partners based on services provided and their location.
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Product
Benchtop Metrology System
FilmTek 2000 SE
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Scientific Computing International
Benchtop metrology system delivering unmatched measurement performance, versatility, and speed for unpatterned thin to thick film applications. Ideally suited for academic and R&D settings. Combines spectroscopic rotating compensator ellipsometry, multi-angle polarized spectroscopic reflection, and intuitive material modeling software to make even the most demanding of measurement tasks simple and reliable.
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Dimensional Metrology
Fleet Connectivity & Control Family
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Nova’s Fleet Management and Performance Monitoring Center simplify the management and enhance the productivity of Nova tools in the fab. The platform’s ability to process and analyze large amounts of fleet and metrology data using advanced data analytic tools provides our customers with intelligent and predictive insights on tool performance and process trends.
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Product
High-Speed & High-Precision Alignment for Display Metrology
LMK Position
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TechnoTeam Bildverarbeitung GmbH
The LMK Position is a photometric robotic system combining LMK-based machine vision with the high precision and flexible movements of a 6-axis Denso VS industrial robot and, optionally, a JETI specbos spectroradiometer. It allows effective and cost-efficient accompanying measurements during research and development tasks and rapid small-series product testing of all kinds of display systems.
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Metrology System
IMPULSE V
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With tighter wafer-to-wafer and within-wafer uniformity tolerances, integrated metrology systems are in use across various semiconductor processing steps. Based on demonstrated high-resolution optical technology, the IMPULSE V system provides higher sensitivity to thin film residue measurements during the CMP process. The IMPULSE platform boasts the industry’s most reliable hardware with best-in-class reliability and productivity metrics.
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In-Line Metrology
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For industrial applications, k-Space is known for its ability to provide robust data and analysis for in-line solutions in production environments. k-Space works side by side with the customer to understand their specific measurement and inspection needs, and then develops a custom solution to meet the identified requirements. Our solution includes custom measurement technology, software, database generation and integration, go/no go determination, pick and place, alarm status, and PLC communication.
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In-Line Metrology
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In-line metrology systems are integrated into production lines for comprehensive process control during substrate transfer between deposition chambers.
